For production of the next generation semiconductor elements, it is indispensable to acquire CVD film deposition mechanism that is applicable to wide variety of metals.
　 WACOM R & D has accomplished to produce vaporizers to be used for such CVD film deposition system, and is now intent on development of applications for this system.
　 WACOM R & D has also accomplished to deposit FeRAM capacitor film, DRAM capacitor film, electrode film, and metal thin film by MOCVD (Metal Organic Chemical Vapor Deposition) method and MOALD (Metal Organic Atomic Layer Deposition) method.
　 WACOM R & D intends to contribute to human happiness, the peace of the world, and environmental safeguard through continuous effort towards realization of their ideal technology.

February 1, 2007
WACOM R&D Corporation
Masaki Kusuhara, President